Title :
The effects of ionizing radiation on the Honeywell HTMOS high temperature linear CMOS technology
Author :
Larsen, D. ; Welling, P. ; Tsacoyeanes, W.
Author_Institution :
The Charles Stark Draper Lab. Inc., Cambridge, MA, USA
Abstract :
The high dose-rate transient response and radiation hardness to total ionizing dose of Honeywell´s HTMOS 10 V linear technology were evaluated. Although this technology was designed for high-temperature applications, all irradiation and measurements herein were performed at room temperature. Results show that the HT1104 Quad Operational Amplifier and HT1204 Quad Analog Switch survive 5×1011 rads(Si)/s, with recovery times ⩽10 μs. Although all devices were functional to 1 Mrad(SiO2), significant increases in IC current parameters were observed. The HT1204 off-state leakage current fell from manufacturer specification by 100 krads(SiO2). This work suggests that although linear ICs derived from a hardened CMOS/SOI technology sustain latch-up immunity and fast recovery from high dose rates, it is nontrivial to sustain total dose hardness, while modifying processes to accommodate high-temperature applications
Keywords :
CMOS analogue integrated circuits; integrated circuit testing; leakage currents; radiation effects; radiation hardening (electronics); silicon-on-insulator; transient response; 10 V; 10 mus; HT1104; HT1204; Honeywell HTMOS technology; IC current parameters; Si; fast recovery; hardened CMOS/SOI technology; high dose rates; high dose-rate transient response; high temperature linear CMOS technology; ionizing radiation effects; irradiation; latchup immunity; leakage current; linear ICs; quad analog switch; quad operational amplifier; radiation hardness; total dose hardness; CMOS process; CMOS technology; Ionizing radiation; Leakage current; Manufacturing; Operational amplifiers; Performance evaluation; Switches; Temperature; Transient response;
Conference_Titel :
Radiation Effects Data Workshop, 1996., IEEE
Conference_Location :
Indian Wells, CA
Print_ISBN :
0-7803-3398-5
DOI :
10.1109/REDW.1996.574189