DocumentCode
2833289
Title
Fabrication of micro-thin film thermocouples
Author
Miyazaki, K. ; Takamiya, T. ; Tsukamoto, H.
Author_Institution
Dept. of Biol. Functions & Eng., Kyushu Inst. of Technol., Kitakyushu, Japan
fYear
2003
fDate
17-21 Aug. 2003
Firstpage
673
Lastpage
676
Abstract
We fabricated thin film thermocouples (TFTCs) to measure temperature distributions at the micro-scale. Nickel film was deposited as the first thermocouple material. Silicon dioxide was then deposited on the Ni film as an insulator. To make the thermocouple junctions, micro-holes were opened by focused ion beam (FIB), and tungsten film was patterned on the insulator as the. second thermocouple material. The thermocouple junctions were 0.5 μm across. We also fabricated a micro-heater near the micro-TFTCs. The heat flux from the micro-heater was estimated by measuring the applied electric power. By using this micro-heater we calibrated the micro-TFTCs without using other thermocouples. With this setup, we have measured temperature distributions with 10 μm spatial resolution, which is finer than that of an IR-microscope.
Keywords
MIM devices; insulating thin films; metallic thin films; micromechanical devices; nickel; silicon compounds; temperature distribution; thermocouples; tungsten; 0.5 micron; Ni-SiO2-W; micro-heater; micro-thin film thermocouples; temperature distributions; thermocouple junctions; Fabrication; Insulation; Ion beams; Nickel; Semiconductor films; Silicon compounds; Temperature distribution; Temperature measurement; Transistors; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermoelectrics, 2003 Twenty-Second International Conference on - ICT
Print_ISBN
0-7803-8301-X
Type
conf
DOI
10.1109/ICT.2003.1287602
Filename
1287602
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