• DocumentCode
    2833289
  • Title

    Fabrication of micro-thin film thermocouples

  • Author

    Miyazaki, K. ; Takamiya, T. ; Tsukamoto, H.

  • Author_Institution
    Dept. of Biol. Functions & Eng., Kyushu Inst. of Technol., Kitakyushu, Japan
  • fYear
    2003
  • fDate
    17-21 Aug. 2003
  • Firstpage
    673
  • Lastpage
    676
  • Abstract
    We fabricated thin film thermocouples (TFTCs) to measure temperature distributions at the micro-scale. Nickel film was deposited as the first thermocouple material. Silicon dioxide was then deposited on the Ni film as an insulator. To make the thermocouple junctions, micro-holes were opened by focused ion beam (FIB), and tungsten film was patterned on the insulator as the. second thermocouple material. The thermocouple junctions were 0.5 μm across. We also fabricated a micro-heater near the micro-TFTCs. The heat flux from the micro-heater was estimated by measuring the applied electric power. By using this micro-heater we calibrated the micro-TFTCs without using other thermocouples. With this setup, we have measured temperature distributions with 10 μm spatial resolution, which is finer than that of an IR-microscope.
  • Keywords
    MIM devices; insulating thin films; metallic thin films; micromechanical devices; nickel; silicon compounds; temperature distribution; thermocouples; tungsten; 0.5 micron; Ni-SiO2-W; micro-heater; micro-thin film thermocouples; temperature distributions; thermocouple junctions; Fabrication; Insulation; Ion beams; Nickel; Semiconductor films; Silicon compounds; Temperature distribution; Temperature measurement; Transistors; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 2003 Twenty-Second International Conference on - ICT
  • Print_ISBN
    0-7803-8301-X
  • Type

    conf

  • DOI
    10.1109/ICT.2003.1287602
  • Filename
    1287602