DocumentCode :
283500
Title :
A novel strained quantum well laser emitting at 1.5 μm
Author :
Tothill, J.N. ; Monserrat, K.J. ; Hatch, C.B. ; Henning, I.D.
Author_Institution :
British Telecom Res. Labs., Martlesham Heath, UK
fYear :
1988
fDate :
32443
Firstpage :
42461
Lastpage :
42463
Abstract :
The authors have grown a laser structure based on a InxGa1-xAs/InyGa1-yAs strained layer superlattice active region which emits at ~1.55 μm. An active region thickness of 44 nm gave the lowest threshold current density, Jth. This value of Jth is over an order of magnitude better than would have been obtained using a similar InGaAsP active layer thickness. This reduction in Jth for this thickness of active layer must be due to a reduction in the Auger processes. The high efficiency observed implies a reduction in optical losses. The lasers are considered for long haul telecommunications
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; optical communication equipment; semiconductor junction lasers; semiconductor quantum wells; 1.5 micron; 1.55 micron; Auger processes; InxGa1-xAs-InyGa1-yAs; active region thickness; high efficiency; long haul telecommunications; reduction in optical losses; strained layer superlattice active region; strained quantum well laser emitting; threshold current density;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Heterojunction and Quantym Well Devices: Physics, Engineering and Applications, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
209516
Link To Document :
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