• DocumentCode
    2837017
  • Title

    Impact of lithographic irregularity across mm-scale photonic-crystal notch filters

  • Author

    Talneau, A. ; Lemarchand, F. ; Fehrembach, A.-L. ; Sentenac, A.

  • Author_Institution
    Lab. de Photonique et de Nanostruct., CNRS, Marcoussis, France
  • fYear
    2009
  • fDate
    14-19 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    We investigate the impact of electronic lithography writing conditions on the performances of two-dimensional grating notch filters fabricated on SiO2/Ta2O5 stack. Field stitching errors as well as electron beam writing step are considered.
  • Keywords
    diffraction gratings; electron beam lithography; optical fabrication; optical filters; photonic crystals; silicon compounds; tantalum compounds; SiO2-Ta2O5; electron beam writing step; electronic lithographic irregularity; field stitching errors; photonic-crystal notch filters; two-dimensional grating notch filter fabrication; Calibration; Electron beams; Gratings; Lithography; Nanopatterning; Nanostructures; Optical filters; Optical reflection; Resonance; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4244-4079-5
  • Electronic_ISBN
    978-1-4244-4080-1
  • Type

    conf

  • DOI
    10.1109/CLEOE-EQEC.2009.5194810
  • Filename
    5194810
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2837017