Title :
Surface deformation phenomena induced by electron-beam irradiation in InGaAs/AlGaAs strained layers on GaAs(100) and (311)B substrates
Author :
Ogawa, T. ; Kawase, M. ; Akabori, M. ; Motohisa, J. ; Fukui, I.
Author_Institution :
Res. Center for Interface Quantum Electron., Hokkaido Univ., Sapporo, Japan
Abstract :
We have found that mass transport phenomena were induced by electron-beam irradiation in strained In0.36Ga0.64As-Al0.3Ga0.7As layers on GaAs (100) and (311)B substrates. The strained InGaAs/AlGaAs layer structures have been grown on GaAs (100)and (311)B substrates in a horizontal low-pressure metaloganic vapor phase epitaxy system at a temperature of 800°C and 830°C. In the surface observation using high-resolution scanning electron microscope, the surface morphology was changed into a deformed structure by electron beam with the accelerating voltage of 30 kV and the scanning time of 60~-120 sec. The surface deformation phenomena were observed in real time on the display of SEM, the deformation was nor amorphous-carbon contamination. The mass transport seems to be caused by the residual strain relaxation due to electron-beam irradiation
Keywords :
III-V semiconductors; aluminium compounds; electron beam effects; gallium arsenide; indium compounds; scanning electron microscopy; semiconductor epitaxial layers; surface structure; vapour phase epitaxial growth; (311)B substrates; 30 kV; 60 to 120 s; 800 C; 830 C; GaAs; GaAs(100); In0.36Ga0.64As-Al0.3Ga0.7 As; In0.36Ga0.64As/Al0.3Ga0.7 As layers; InGaAs-AlGaAs; InGaAs/AlGaAs strained layers; SEM; electron-beam irradiation; high-resolution scanning electron microscope; horizontal low-pressure metaloganic vapor phase epitaxy system; surface deformation phenomena; surface morphology; Acceleration; Electron beams; Epitaxial growth; Gallium arsenide; Indium gallium arsenide; Scanning electron microscopy; Substrates; Surface contamination; Surface morphology; Temperature;
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
Print_ISBN :
0-7803-4220-8
DOI :
10.1109/ICIPRM.1998.712695