• DocumentCode
    2840421
  • Title

    A novel self-aligned substrate-diode structure for SOI technologies

  • Author

    Pelella, Mario M ; Burbach, Gert ; Salman, A. ; Chan, Daniel ; Buller, J.

  • Author_Institution
    Adv. Micro Devices, Sunnyvale, CA, USA
  • fYear
    2005
  • fDate
    3-6 Oct. 2005
  • Firstpage
    169
  • Lastpage
    170
  • Abstract
    In this work, we describe novel self-aligned diode and resistor structures and their process integration into an advanced 90nm SOI technology. Their superior device characteristics over conventional device structures built within the SOI film is described.
  • Keywords
    nanotechnology; resistors; semiconductor diodes; silicon-on-insulator; 90 nm; SOI film; self-aligned resistor structures; self-aligned substrate-diode structure; silicon-on-insulator; CMOS process; CMOS technology; Conductivity; MOSFETs; Research and development; Resistors; Semiconductor diodes; Silicon on insulator technology; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2005. Proceedings. 2005 IEEE International
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-9212-4
  • Type

    conf

  • DOI
    10.1109/SOI.2005.1563576
  • Filename
    1563576