DocumentCode
2840613
Title
Raman amplification and lasing in SiGe-on-insulator waveguides
Author
Raghunathan, V. ; Claps, R. ; Boyraz, O. ; Koonath, P. ; Dimitropoulos, D. ; Jalali, B.
Author_Institution
California Univ., Los Angeles, CA, USA
fYear
2005
fDate
3-6 Oct. 2005
Firstpage
196
Lastpage
197
Abstract
Stimulated Raman scattering in SOI waveguides has received significant attention recently with the demonstration of pulsed, continuous wave Raman lasers and high gain Raman amplification. However, the limited bandwidth of the Raman signal in silicon (∼105GHz) renders this scheme unsuitable for broadband WDM amplification unless multi-pumping scheme is employed. Large pulsed gain and lasing have been reported in GeSi waveguides. The SiGe on SOI platform represents a Raman medium with a flexible gain spectrum.
Keywords
Ge-Si alloys; Raman spectra; amplification; semiconductor lasers; silicon-on-insulator; waveguides; Raman amplification; Raman lasing; Raman signal; SOI waveguides; SiGe; SiGe-on-insulator waveguides; pulsed continuous wave Raman lasers; stimulated Raman scattering; Fiber nonlinear optics; Germanium silicon alloys; Nonlinear optics; Optical waveguides; Phonons; Pulse amplifiers; Raman scattering; Silicon germanium; Stimulated emission; Superlattices;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2005. Proceedings. 2005 IEEE International
ISSN
1078-621X
Print_ISBN
0-7803-9212-4
Type
conf
DOI
10.1109/SOI.2005.1563586
Filename
1563586
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