DocumentCode
2841133
Title
Contamination control methods-a review of recent progress
Author
Vig, John R.
Author_Institution
US Army Electron. Technol. & Devices Lab., Fort Monmouth, NJ, USA
fYear
1990
fDate
23-25 May 1990
Firstpage
201
Lastpage
206
Abstract
The author reviews a selection of papers from the First International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (held in October 1989) which is applicable to frequency control device processing. The topics of the 43 papers presented included wet cleaning technologies, dry cleaning technologies, particles and airborne contaminants, and the characterization of cleaning. A table of organic contaminants in clean rooms is given. The evolution of particle control requirements is discussed
Keywords
clean rooms; crystal resonators; etching; quality control; quartz; surface treatment; ultrasonic applications; airborne contaminants; characterization of cleaning; clean rooms; dry cleaning technologies; frequency control device processing; organic contaminants; particle control requirements; particles; reviews; wet cleaning technologies; Electronics industry; Filters; Frequency control; Industrial control; Manufacturing industries; Paper technology; Semiconductor device manufacture; Semiconductor devices; Surface cleaning; Surface contamination;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control, 1990., Proceedings of the 44th Annual Symposium on
Conference_Location
Baltimore, MD
Type
conf
DOI
10.1109/FREQ.1990.177498
Filename
177498
Link To Document