Title :
Contamination control methods-a review of recent progress
Author_Institution :
US Army Electron. Technol. & Devices Lab., Fort Monmouth, NJ, USA
Abstract :
The author reviews a selection of papers from the First International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (held in October 1989) which is applicable to frequency control device processing. The topics of the 43 papers presented included wet cleaning technologies, dry cleaning technologies, particles and airborne contaminants, and the characterization of cleaning. A table of organic contaminants in clean rooms is given. The evolution of particle control requirements is discussed
Keywords :
clean rooms; crystal resonators; etching; quality control; quartz; surface treatment; ultrasonic applications; airborne contaminants; characterization of cleaning; clean rooms; dry cleaning technologies; frequency control device processing; organic contaminants; particle control requirements; particles; reviews; wet cleaning technologies; Electronics industry; Filters; Frequency control; Industrial control; Manufacturing industries; Paper technology; Semiconductor device manufacture; Semiconductor devices; Surface cleaning; Surface contamination;
Conference_Titel :
Frequency Control, 1990., Proceedings of the 44th Annual Symposium on
Conference_Location :
Baltimore, MD
DOI :
10.1109/FREQ.1990.177498
