DocumentCode :
2841254
Title :
Automatic frequency control in chemical etching of quartz crystal blanks
Author :
Sauerland, Franz L.
Author_Institution :
Transat Corp., Solon, OH, USA
fYear :
1990
fDate :
23-25 May 1990
Firstpage :
246
Lastpage :
250
Abstract :
A method and system for measuring the resonance frequency of piezoelectric resonators in conductive fluids are described. One of its applications is in the chemical etching of quartz crystal blanks, where it can be used to monitor and control either the etch rate of the etchant or the etching of blanks to a targeted thickness or frequency. The system is composed of a crystal etch monitor in conjunction with special electrodes that are designed to take account and advantage of the conductive nature of the etchant. It can etch a load of blanks or a monitor blank different from the etch load but immersed in the same etchant. When the blank reaches a predetermined target, an etch-termination signal is triggered that can be used to alert an operator or to initiate action for automatic etch termination
Keywords :
automatic frequency control; crystal resonators; etching; frequency measurement; process control; quartz; AFC; SiO2 crystal resonators; automatic etch termination; automatic frequency control; chemical etching; conductive fluids; crystal etch monitor; etch rate; etch-termination signal; etching of blanks; piezoelectric resonators; quartz crystal blanks; resonant frequency monitoring; special electrodes; targeted thickness; Automatic frequency control; Chemicals; Conductivity measurement; Electrodes; Etching; Frequency measurement; Monitoring; Resonance; Resonant frequency; Thickness control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control, 1990., Proceedings of the 44th Annual Symposium on
Conference_Location :
Baltimore, MD
Type :
conf
DOI :
10.1109/FREQ.1990.177504
Filename :
177504
Link To Document :
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