DocumentCode
2842962
Title
Application of SiGe heterojunction transistors in silicon based monolithic millimeter-wave integrated circuits
Author
Rong, Liu ; Wensheng, Qian ; Tongli, Wet
Author_Institution
Microelectron. Center, Southeast Univ., Nanjing, China
fYear
1998
fDate
1998
Firstpage
209
Lastpage
213
Abstract
Silicon-based millimeter-wave integrated circuits are playing more and more important roles in high frequency microwave electronics. Recent progress in SiGe device technology has improved cutoff frequencies of these devices to beyond 110 GHz. Such high speed transistors, compatible with standard, industrial Si production lines, allow low cost, high level integration and make the fabrication of silicon-based monolithic millimeter-wave integrated circuits (MIMICs) a genuine possibility. This paper presents a one dimensional calculation of the transistor performance and the trade-offs available to operate this device at millimeter-waves frequencies. The device structure of a SiGe heterojunction bipolar transistor and the Si-SiGe MIMIC technology are discussed
Keywords
Ge-Si alloys; bipolar MIMIC; heterojunction bipolar transistors; millimetre wave bipolar transistors; semiconductor materials; 110 GHz; EHF; Si based monolithic MM-wave ICs; Si production line compatibility; Si-SiGe; Si-SiGe MIMIC technology; SiGe heterojunction transistors; cutoff frequencies; fabrication; heterojunction bipolar transistor; high speed transistors; millimeter-wave integrated circuits; transistor performance calculation; Cutoff frequency; Germanium silicon alloys; Heterojunctions; Integrated circuit technology; MIMICs; Microwave devices; Microwave transistors; Millimeter wave integrated circuits; Silicon germanium; Textile industry;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology Proceedings, 1998. ICMMT '98. 1998 International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4308-5
Type
conf
DOI
10.1109/ICMMT.1998.768262
Filename
768262
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