• DocumentCode
    2843619
  • Title

    The effect of acid on fast through-hole filling by Cu electroplating

  • Author

    Yan, Jhih-Jyun ; Chang, Liang-Chun ; Lu, Chun-Wei ; Dow, Wei-Ping ; Liu, An-Hong ; Wang, David W.

  • Author_Institution
    Dept. of Chem. Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
  • fYear
    2011
  • fDate
    19-21 Oct. 2011
  • Firstpage
    485
  • Lastpage
    487
  • Abstract
    Through-holes (TH) filling of printed circuit board (PCB) by copper electroplating using single organic additive was carried out. The inhibition of the organic additive was sensitive to acid. We chose different kind of organic acids with different concentrations as supporting electrolytes to achieve TH copper filling, which was called butterfly technology (BFT). To reduce plating time, high current density was necessary but it had to combine with raising the concentration of chloride ions and force convection. These combinations can significantly improve the filling performance of the copper plating solution. All of the results of electroplating were observed by optical microscope (OM).
  • Keywords
    additives; copper; electrolytes; electroplating; filling; optical microscopes; packaging; printed circuits; Cu; TH copper filling; acid effect; butterfly technology; copper electroplating; electrolytes; optical microscope; organic additive inhibition; printed circuit board; single organic additive; through-hole filling; Additives; Copper; Current density; Filling; IEEE catalog; Ions; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2011 6th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Print_ISBN
    978-1-4577-1387-3
  • Electronic_ISBN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2011.6117288
  • Filename
    6117288