DocumentCode :
2844387
Title :
Process Variation Tolerant SRAM Cell Design
Author :
Varanasi, Suresh Kumar ; Mandavilli, Satyam
Author_Institution :
Int. Inst. of Inf. Technol., Hyderabad, India
fYear :
2011
fDate :
19-21 Dec. 2011
Firstpage :
82
Lastpage :
87
Abstract :
One of the major hurdles in the design of Static Random Access Memory (SRAM) cell is the ever increasing process variations. To counter this researchers have proposed various bit-cell and non-bit-cell oriented designs. However, the proposed techniques require additional circuitry and hence account for large area overhead. In this paper we propose the use of rise time of word-line signal as a measure to reduce the impact of the process variations on the SRAM cells. Simulation results show that using a higher rise time resulted in drastic reduction in the number of cells that fail to read or write. Number of cells that can successfully write or read improved from 82% to 98.2% and 90% to 98.8% respectively. However, there is some speed penalty to achieve this.
Keywords :
SRAM chips; logic design; bit-cell oriented design; nonbit-cell oriented design; process variation tolerant SRAM cell design; static random access memory cell; word-line signal; Capacitance; Histograms; Random access memory; Threshold voltage; Transistors; Voltage measurement; Input rise time; Process Variations; SRAM; Variation tolerant;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic System Design (ISED), 2011 International Symposium on
Conference_Location :
Kochi, Kerala
Print_ISBN :
978-1-4577-1880-9
Type :
conf
DOI :
10.1109/ISED.2011.22
Filename :
6117331
Link To Document :
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