DocumentCode :
2844432
Title :
Vertical device operation of AlGaN/GaN HEMTs on free-standing n-GaN substrates
Author :
Sugimoto, Masahiro ; Ueda, Hiroyuki ; Kanechika, Masakazu ; Soejima, Narumasa ; Uesugi, Tsutomu ; Kachi, Tetsu
Author_Institution :
Toyota Motor Corp., Toyota
fYear :
2007
fDate :
2-5 April 2007
Firstpage :
368
Lastpage :
372
Abstract :
We report on the demonstration of normally off and normally on vertical AlGaN/GaN high electron mobility transistors (HEMTs). The normally off device shows the threshold voltage of 1.6 V. The normally on device shows the normalized on resistance of 1.48 mOmega-cm2 and the maximum drain current density of 3.9 kA/cm2. Before then, the dependence of threshold voltage on the thickness of n-GaN in the structure of AlGaN/n-GaN/p-GaN was studied experimentally.
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium compounds; high electron mobility transistors; AlGaN-GaN; GaN; HEMT; drain current density; free-standing n-GaN substrates; high-electron mobility transistors; vertical device operation; voltage 1.6 V; Aluminum gallium nitride; Electrodes; Gallium nitride; HEMTs; Insulated gate bipolar transistors; Inverters; MODFETs; Substrates; Threshold voltage; Wideband; AlGaN/GaN HEMT; normally off; normally on; vertical;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Conversion Conference - Nagoya, 2007. PCC '07
Conference_Location :
Nagoya
Print_ISBN :
1-4244-0844-X
Electronic_ISBN :
1-4244-0844-X
Type :
conf
DOI :
10.1109/PCCON.2007.372994
Filename :
4239184
Link To Document :
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