• DocumentCode
    2844432
  • Title

    Vertical device operation of AlGaN/GaN HEMTs on free-standing n-GaN substrates

  • Author

    Sugimoto, Masahiro ; Ueda, Hiroyuki ; Kanechika, Masakazu ; Soejima, Narumasa ; Uesugi, Tsutomu ; Kachi, Tetsu

  • Author_Institution
    Toyota Motor Corp., Toyota
  • fYear
    2007
  • fDate
    2-5 April 2007
  • Firstpage
    368
  • Lastpage
    372
  • Abstract
    We report on the demonstration of normally off and normally on vertical AlGaN/GaN high electron mobility transistors (HEMTs). The normally off device shows the threshold voltage of 1.6 V. The normally on device shows the normalized on resistance of 1.48 mOmega-cm2 and the maximum drain current density of 3.9 kA/cm2. Before then, the dependence of threshold voltage on the thickness of n-GaN in the structure of AlGaN/n-GaN/p-GaN was studied experimentally.
  • Keywords
    III-V semiconductors; aluminium compounds; current density; gallium compounds; high electron mobility transistors; AlGaN-GaN; GaN; HEMT; drain current density; free-standing n-GaN substrates; high-electron mobility transistors; vertical device operation; voltage 1.6 V; Aluminum gallium nitride; Electrodes; Gallium nitride; HEMTs; Insulated gate bipolar transistors; Inverters; MODFETs; Substrates; Threshold voltage; Wideband; AlGaN/GaN HEMT; normally off; normally on; vertical;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Conversion Conference - Nagoya, 2007. PCC '07
  • Conference_Location
    Nagoya
  • Print_ISBN
    1-4244-0844-X
  • Electronic_ISBN
    1-4244-0844-X
  • Type

    conf

  • DOI
    10.1109/PCCON.2007.372994
  • Filename
    4239184