Title :
Model of activation dynamics for an FES-induced muscle fatigue
Author :
Lim, Jong-Kwang ; Nam, Moon-Hyon ; Khang, Gon
Author_Institution :
Agency for Defense Dev., Daejeon, South Korea
Abstract :
A computer model of activation dynamics for an FES-induced muscle fatigue, which is one of the major problems in functional electrical stimulation (FES) has developed. Model consists of activation dynamics and Hill-type musculotendon dynamics. The authors modified the conventional activation dynamics to represent reduction and recovery of muscle force. By considering that FES can cause the shortening velocity of muscle to decline the authors modified the activation dynamics to affect the muscle shortening velocity. To model muscle fatigue the authors introduced the fatigue variable and the fatigue admittance assuming that the activation changes with the electrical admittance of muscle fibers. The fatigue variable relates the stimulation time to the applying pulses. The fatigue admittance changes the Ca2+ uptake rate and thus the muscle shortening velocity as a function of the fatigue variable. The computer simulation results showed that the proposed admittance-type model match well with the experimental observations reported in literatures in terms of force reduction and recovery as well
Keywords :
bioelectric phenomena; digital simulation; neuromuscular stimulation; physiological models; Ca; Ca2+ uptake rate; FES-induced muscle fatigue; Hill-type musculotendon dynamics; activation dynamics; activation dynamics model; applying pulses; computer simulation results; force recovery; force reduction; functional electrical stimulation; muscle fibers electrical admittance; muscle shortening velocity; stimulation time; Admittance; Biomedical engineering; Computer simulation; Fatigue; Financial advantage program; Joining processes; Mathematical model; Moon; Muscles; Neuromuscular stimulation;
Conference_Titel :
Engineering in Medicine and Biology Society, 2000. Proceedings of the 22nd Annual International Conference of the IEEE
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-6465-1
DOI :
10.1109/IEMBS.2000.900587