Title :
Structure of ultra-short pulsed discharge plasma
Author :
Mizuno, Akira ; Okazaki, Ken ; Takekoshi, Takashi ; Tobe, Ryoki
Author_Institution :
Toyohashi Univ. of Technol., Japan
fDate :
Sept. 28 1991-Oct. 4 1991
Abstract :
The structure of pulsed discharge plasma of CH/sub 4/ mixed with H/sub 2/ and AR gases has been studied for active control of plasma CVD processing. Using square wave pulsed high voltages of 50-1000 ns width, voltage-current characteristics, time lags of current rise from that of voltage, and emission intensity profiles of the plasma have been investigated. Very high voltages up to several kilovolts can be successfully applied without any plasma nonuniformity on the electrode surface because the pulsed voltage drops before transition to arc discharge. during the pulsed period, very large current of more than 10/sup 3/ that of DC plasma can be established.<>
Keywords :
arcs (electric); electrostatic devices; electrostatics; plasma CVD; pulsed power technology; 50 to 1000 ns; HV; arc discharge; electrostatics; emission intensity; plasma CVD; pulsed discharge plasma; pulsed power technology; pulsed voltage; structure; time lags; voltage-current characteristics; Electrodes; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma temperature; Plasma waves; Space vector pulse width modulation; Voltage control;
Conference_Titel :
Industry Applications Society Annual Meeting, 1991., Conference Record of the 1991 IEEE
Conference_Location :
Dearborn, MI, USA
Print_ISBN :
0-7803-0453-5
DOI :
10.1109/IAS.1991.178315
