DocumentCode :
2847122
Title :
Automated wafer analysis using wafer map autocorrelation
Author :
Hopcraft, G.
Author_Institution :
Hewlett-Packard, USA
fYear :
1998
fDate :
3-4 Dec. 1998
Firstpage :
82
Lastpage :
87
Abstract :
A complete wafer map contains information sufficient to discriminate certain prober errors, parametric errors, and point defect errors even without the full measured data set. Autocorrelation of the wafer map allows a simple automated analysis system to provide immediate feedback to the operator of known errors, allowing immediate retest in case of wafer probing errors and providing information to process engineers about possible manufacturing errors. The author provides a description of an algorithm which has proven useful in increasing measured yield and differentiating point defect errors from more traditional process errors.
Keywords :
correlation methods; failure analysis; inspection; integrated circuit yield; algorithm; automated autocorrelation analysis; parametric error; point defect error; prober error; process error; wafer failure map; yield; Autocorrelation; Detectors; Feedback; Information analysis; Manufacturing automation; Manufacturing processes; Pattern recognition; Scattering; Testing; White noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ARFTG Conference Digest, 1998. Computer-Aided Design and Test for High-Speed Electronics. 52nd
Conference_Location :
Rohnert Park, CA, USA
Print_ISBN :
0-7803-5686-1
Type :
conf
DOI :
10.1109/ARFTG.1998.768628
Filename :
768628
Link To Document :
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