DocumentCode :
2847143
Title :
Non-destructive photoreflectance characterization of sheet carrier density in InAlAs/InGaAs HEMTs
Author :
Sugiyama, H. ; Yokoyama, H. ; Wada, K.
Author_Institution :
NTT Syst. Electron. Labs., Kanagawa, Japan
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
755
Lastpage :
757
Abstract :
Using room-temperature-photoreflectance (PR), we have succeeded in characterizing InGaAs channel layers of InAlAs/InGaAs high electron mobility transistors (HEMTs). The few peaks are observed in the PR spectra correspond to the transitions between ground- and excited subbands of 2DEG and 2DHG in the channel layer. The peak shift to the higher energy side is monitored with increasing Ns. Thus, PR spectroscopy is quite useful for the non-destructive characterization of Ns at room temperature
Keywords :
III-V semiconductors; aluminium compounds; carrier density; gallium arsenide; high electron mobility transistors; indium compounds; photoreflectance; InAlAs-InGaAs; InAlAs/InGaAs HEMTs; high electron mobility transistors; nondestructive photoreflectance characterization; room-temperature-photoreflectance; sheet carrier density; Charge carrier density; Electrons; HEMTs; Indium compounds; Indium gallium arsenide; Laser beams; Laser excitation; MODFETs; Monitoring; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712766
Filename :
712766
Link To Document :
بازگشت