DocumentCode :
2848261
Title :
Anomalous behavior in stacked-gate MOS tetrodes
Author :
Dill, H. ; Bower, R. ; Aubuchon, K. ; Toombs, T.
Author_Institution :
Hughes Research Laboratories, Newport Beach, CA, USA
Volume :
XII
fYear :
1969
fDate :
19-21 Feb. 1969
Firstpage :
44
Lastpage :
45
Abstract :
This paper will describe a new type of trapping effect observed in stacked-gate MOS tetrodes. Control of and application of this effect to an electrically-alterable read-only memory will be discussed.
Keywords :
Acceleration; Circuits; Electron traps; Fabrication; Insulation; Laboratories; Pulse measurements; Stability; Thickness control; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1969 IEEE Internationa
Conference_Location :
Philadelphia, PA, USA
Type :
conf
DOI :
10.1109/ISSCC.1969.1154742
Filename :
1154742
Link To Document :
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