DocumentCode
2848743
Title
Detecting and Analyzing Wafer Bump Voids with X-Ray Inspection
Author
Maur, Friedhelm W.
Author_Institution
COMET China, Shanghai
fYear
2005
fDate
2-2 Sept. 2005
Firstpage
1
Lastpage
3
Abstract
Many different inspection systems are available to manufacturers of electronic components. But new inspection challenges are pushing - and in many cases exceeding - the limits of conventional inspection tools, such as wafer probes and automated optical inspection systems. A more capable alternative is X-ray technology, which can penetrate substrate materials to expose hidden features in electronic assemblies. Equipped with this cutting-edge tool for detecting material flaws and component defects, manufacturers can improve product quality and increase customer satisfaction, while also reducing costs and increasing manufacturing efficiency. This paper discusses X-ray inspection systems and their importance in failure analysis and process control of electronic components. Besides describing basic X-ray technology, the paper looks at a number of recent developments in X-ray systems and shows how these developments improve the inspection of TCs, PCBs, packages, and wafer bumps
Keywords
X-ray imaging; automatic optical inspection; electron device manufacture; failure analysis; process control; X-ray inspection; automated optical inspection systems; component defects; electronic component manufacturing; failure analysis; material flaws; process control; product quality improvement; wafer bump voids; Assembly; Automatic optical inspection; Costs; Customer satisfaction; Electronic components; Manufacturing; Optical materials; Probes; X-ray detection; X-ray detectors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology, 2005 6th International Conference on
Conference_Location
Shenzhen
Print_ISBN
0-7803-9449-6
Type
conf
DOI
10.1109/ICEPT.2005.1564625
Filename
1564625
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