Title :
Technological vacuum-arc sources of plasma for electronics industry
Author :
Lisenkov, A.A. ; Merva, N.V.
Author_Institution :
Inst. of Mech. Sci. Problems, Acad. of Sci., St. Petersburg, Russia
Abstract :
The physical features and main formation laws of various geometry plasma streams, generated by technological vacuum-arc plasma sources are presented. Applications to plasma deposition in the electronics industry are described briefly
Keywords :
electron device manufacture; plasma deposition; plasma production; vacuum arcs; electronics industry; plasma deposition; plasma formation laws; plasma streams; vacuum-arc plasma sources; Cathodes; Electronics industry; Geometry; Magnetic fields; Magnetic separation; Plasma applications; Plasma devices; Plasma properties; Plasma sources; Vacuum technology;
Conference_Titel :
Electronic Instrument Engineering Proceedings, 1998. APEIE-98. Volume 1. 4th International Conference on Actual Problems of
Conference_Location :
Novosibirsk
Print_ISBN :
0-7803-4938-5
DOI :
10.1109/APEIE.1998.768909
