• DocumentCode
    2849073
  • Title

    RTS and 1/f Noise in Flash Memory

  • Author

    Li, Sing-Rong ; Lu, Yin-Lung R. ; McMahon, William ; Lee, Yung-Huei ; Mielke, Neal

  • Author_Institution
    Intel Corp., Santa Clara
  • fYear
    2007
  • fDate
    23-25 April 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    This work investigates the RTS noise in Flash memory from the perspective of a single cell. In this study, RTS noise in a cell is measured in the frequency domain instead of time domain to increase the efficient identification of individual RTS traps over a broader range of trap lifetime, from seconds to mus in comparison to the conventional time domain approach which typically identifies traps with ms lifetimes at shortest. By converting the frequency domain parameters back to their time domain counterparts, the trap location in the tunneling oxide can be characterized. This work also revisits the relationship between RTS and 1/f noise of flash cells and investigates the change of RTS noise after P/E cycling.
  • Keywords
    1/f noise; MOS memory circuits; MOSFET; flash memories; frequency-domain analysis; semiconductor device noise; 1/f noise; MOSFET; P/E cycling; RTS noise; flash cells; flash memory; frequency domain analysis; individual RTS trap identification; random telegraph signal noise; time domain approach; trap lifetime; trap location; tunneling oxide; Circuit noise; Educational institutions; Electron traps; Flash memory; Frequency domain analysis; RF signals; Radio frequency; Telegraphy; Tellurium; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems and Applications, 2007. VLSI-TSA 2007. International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1524-766X
  • Print_ISBN
    1-4244-0584-X
  • Electronic_ISBN
    1524-766X
  • Type

    conf

  • DOI
    10.1109/VTSA.2007.378918
  • Filename
    4239486