DocumentCode
2849073
Title
RTS and 1/f Noise in Flash Memory
Author
Li, Sing-Rong ; Lu, Yin-Lung R. ; McMahon, William ; Lee, Yung-Huei ; Mielke, Neal
Author_Institution
Intel Corp., Santa Clara
fYear
2007
fDate
23-25 April 2007
Firstpage
1
Lastpage
2
Abstract
This work investigates the RTS noise in Flash memory from the perspective of a single cell. In this study, RTS noise in a cell is measured in the frequency domain instead of time domain to increase the efficient identification of individual RTS traps over a broader range of trap lifetime, from seconds to mus in comparison to the conventional time domain approach which typically identifies traps with ms lifetimes at shortest. By converting the frequency domain parameters back to their time domain counterparts, the trap location in the tunneling oxide can be characterized. This work also revisits the relationship between RTS and 1/f noise of flash cells and investigates the change of RTS noise after P/E cycling.
Keywords
1/f noise; MOS memory circuits; MOSFET; flash memories; frequency-domain analysis; semiconductor device noise; 1/f noise; MOSFET; P/E cycling; RTS noise; flash cells; flash memory; frequency domain analysis; individual RTS trap identification; random telegraph signal noise; time domain approach; trap lifetime; trap location; tunneling oxide; Circuit noise; Educational institutions; Electron traps; Flash memory; Frequency domain analysis; RF signals; Radio frequency; Telegraphy; Tellurium; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems and Applications, 2007. VLSI-TSA 2007. International Symposium on
Conference_Location
Hsinchu
ISSN
1524-766X
Print_ISBN
1-4244-0584-X
Electronic_ISBN
1524-766X
Type
conf
DOI
10.1109/VTSA.2007.378918
Filename
4239486
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