• DocumentCode
    2849131
  • Title

    Dynamic control of high-current ion-electron sources with micro-second length

  • Author

    Orlikov, L.N.

  • Author_Institution
    Tomsk Univ. of Control Syst. & Radioelectron., Russia
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    79
  • Lastpage
    80
  • Abstract
    In ion-electron sources, based on vacuum-arc generators, electrical parameters of plasma generators are related to the shape of the plasma flow and the current density distribution at the target. Plasma-gas dynamic control is performed through formation of the plasma front local parameters. The device efficiency is raised without affecting the electrical parameters
  • Keywords
    current density; current distribution; plasma flow; plasma production; plasma transport processes; process control; vacuum arcs; dynamic control; electrical parameters; high-current ion-electron sources; microsecond length; plasma flow shape; plasma front local parameters; plasma generators; plasma-gas dynamic control; target current density distribution; vacuum-arc generators; Acceleration; Plasma accelerators; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sources; Plasma temperature; Plasma waves; Reproducibility of results;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Instrument Engineering Proceedings, 1998. APEIE-98. Volume 1. 4th International Conference on Actual Problems of
  • Conference_Location
    Novosibirsk
  • Print_ISBN
    0-7803-4938-5
  • Type

    conf

  • DOI
    10.1109/APEIE.1998.768914
  • Filename
    768914