DocumentCode
2849162
Title
Dynamic processes in the technology of film formation for optoelectronic elements
Author
Orlikov, L.N. ; Orlikov, N.L.
Author_Institution
Tomsk Univ. of Radioelectron. & Control Syst., Russia
fYear
1998
fDate
1998
Firstpage
83
Lastpage
84
Abstract
On a basis of notions of the jet nature of vapour exhaust during thermal vacuum evaporation of materials, a link has been established between geometrical and parameter values of an exhaust flow with gas phase reactions and the laws of evaporation. Results are presented for Ti film deposition on NaNbO3
Keywords
evaporation; jets; optical fabrication; optical films; supersonic flow; thermally stimulated desorption; titanium; vacuum deposition; NaNbO3; Ti; Ti film; evaporation laws; exhaust flow; film formation; flow geometry; gas phase reactions; jet nature; optoelectronic elements; supersonic jet; thermal desorption; thermal vacuum evaporation; vapour exhaust; Gases; Magnetic materials; Nitrogen; Optical films; Optical waveguides; Plasma temperature; Pressure control; Temperature control; Vacuum systems; Visualization;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Instrument Engineering Proceedings, 1998. APEIE-98. Volume 1. 4th International Conference on Actual Problems of
Conference_Location
Novosibirsk
Print_ISBN
0-7803-4938-5
Type
conf
DOI
10.1109/APEIE.1998.768916
Filename
768916
Link To Document