DocumentCode :
2849386
Title :
Unipolar CMOS inverter based on punch-through effect with two embedded oxide structure
Author :
Lin, Chia-Hsien ; Lin, Jyi-Tsong ; Chen, Hsuan-Hsu ; Eng, Yi-Chuen ; Wang, Shih-Wei
Author_Institution :
Dept. of EE, Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear :
2011
fDate :
17-18 Nov. 2011
Firstpage :
1
Lastpage :
2
Abstract :
This paper presents a novel NMOS structure called two-embedded oxide (2EO) to replace the conventional PMOS transistor in a CMOS inverter. According to TCAD simulations, the 2EO is used to control the punch-through current to achieve the desired characteristics for a CMOS inverter. More importantly, compared with the conventional CMOS layout, due to the presence of two NMOS transistors to share the output contact, a reduction in mask-layout area (improved 59%) is observed. Compared with the EO, our proposed 2EO can reduce the static power consumption by 33%, for achieving a requirement of reduced static power consumption in a non-conventional CMOS.
Keywords :
CMOS integrated circuits; MOSFET; invertors; low-power electronics; 2EO structure; NMOS transistors; TCAD simulations; mask-layout area; punch-through current; static power consumption; two-embedded oxide structure; unipolar CMOS inverter; CMOS integrated circuits; Inverters; Layout; Logic gates; Power demand; Transistors; Two-embedded oxide (2EO); punch-through current; static power consumption; unipolar CMOS;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2011 International Conference of
Conference_Location :
Tianjin
ISSN :
Pending
Print_ISBN :
978-1-4577-1998-1
Electronic_ISBN :
Pending
Type :
conf
DOI :
10.1109/EDSSC.2011.6117607
Filename :
6117607
Link To Document :
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