DocumentCode :
2849415
Title :
Mask-making technology
Author :
Lemke, G.
Author_Institution :
IBM Corp, East Fishkill, NY, USA
Volume :
XIII
fYear :
1970
fDate :
18-20 Feb. 1970
Firstpage :
148
Lastpage :
149
Abstract :
In developing a mature LSI and MSI product capability, the quality of the primary artwork or masks has emerged as one of the chief determinants of yield and resulting cost. This paper will review the state-of-the-art of masking technology, with discussions of various methods. The limitations and advantages of each will be described, with an indication of the level of excellence in practice in the industry.
Keywords :
Art; Availability; Cameras; Flowcharts; Packaging machines; Printing; Resists; Silver; Size control; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1970 IEEE International
Conference_Location :
Philadelphia, PA, USA
Type :
conf
DOI :
10.1109/ISSCC.1970.1154818
Filename :
1154818
Link To Document :
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