DocumentCode :
2849432
Title :
Highly Reliable SuperFlash® Embedded Memory Scaling for Low Power SoC
Author :
Chen, Bomy
Author_Institution :
Silicon Storage Technol. Inc., Sunnyvale
fYear :
2007
fDate :
23-25 April 2007
Firstpage :
1
Lastpage :
2
Abstract :
The novel source side injection approach used by SuperFlashreg provides substantially lower power programming than the traditional drain side channel hot electron programming method. The poly-poly erase structure of SuperFlash provides SoC designs with 3 orders of magnitude faster erase speed without the over-erase circuitry overhead and long test time. The basic physics of program and erase methods sets the foundation for low power and high reliability margins for both endurance and data retention. Second generation SuperFlash with smaller memory cell size maintains this fundamental advantage for SoC scaling. Using self-aligned word lines and source lines avoids the alignment factor of scaling. As the Vdd of basic CMOS scaling shrinks to 1.8~1.0 V, the fundamental limitation of traditional stack gate requires a word line read pump that creates additional circuit overhead and complicates the design. The 3rd generation SuperFlash with split-gate cell and erase-gate can continuously scale the read voltage in lockstep with the basic CMOS Vdd without adding a word line read pump. Endurance of one million cycles with 1.8 V word line read operation is confirmed with the 3rd generation SuperFlashreg memory cell technology.
Keywords :
CMOS logic circuits; CMOS memory circuits; charge injection; flash memories; integrated circuit reliability; system-on-chip; CMOS scaling shrinks; data retention; erase-gate; highly reliable SuperFlash embedded memory scaling; low power SoC designs; lower power programming method; over-erase circuitry; poly-poly erase structure; self-aligned word line read pump; source lines; source side injection approach; split-gate cell; traditional drain side channel hot electron programming method; voltage 1.8 V; Abstracts; CMOS memory circuits; Circuit testing; Electrons; Maintenance; Nonvolatile memory; Physics; Silicon; Split gate flash memory cells; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems and Applications, 2007. VLSI-TSA 2007. International Symposium on
Conference_Location :
Hsinchu
ISSN :
1524-766X
Print_ISBN :
1-4244-0584-X
Electronic_ISBN :
1524-766X
Type :
conf
DOI :
10.1109/VTSA.2007.378941
Filename :
4239509
Link To Document :
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