DocumentCode
2849614
Title
High speed silicon-on-sapphire 50-stage shift register
Author
Meyer, Jorg ; Burns, Jack ; Scott, James
Author_Institution
RCA Laboratories, Princeton, NJ, USA
Volume
XIII
fYear
1970
fDate
18-20 Feb. 1970
Firstpage
200
Lastpage
201
Abstract
developed and have resulted in the successful realization of hlgh performance silicon-on-sapphire shift-register arrays. Features of the array are clocked operation from 300 kHz to 75 MHz over 50 stages. A complementary MOS process sequence utilized in the array fabrication resulted in yields as high as 50% and produced high-quality complementary devices wit11 field-effect mobilities of 320 and 160 cm´/V-s for electrons and holes, respectively. The drastic reduction of parasitic capacitance inherent in SOS technology combined witn these device characteristics was found to provide circuits, while retaining all of the other desirable characteristics.
Keywords
Boron; Charge carrier processes; Circuits; Clocks; Electron mobility; Etching; Laboratories; Shift registers; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1970 IEEE International
Conference_Location
Philadelphia, PA, USA
Type
conf
DOI
10.1109/ISSCC.1970.1154834
Filename
1154834
Link To Document