• DocumentCode
    2849614
  • Title

    High speed silicon-on-sapphire 50-stage shift register

  • Author

    Meyer, Jorg ; Burns, Jack ; Scott, James

  • Author_Institution
    RCA Laboratories, Princeton, NJ, USA
  • Volume
    XIII
  • fYear
    1970
  • fDate
    18-20 Feb. 1970
  • Firstpage
    200
  • Lastpage
    201
  • Abstract
    developed and have resulted in the successful realization of hlgh performance silicon-on-sapphire shift-register arrays. Features of the array are clocked operation from 300 kHz to 75 MHz over 50 stages. A complementary MOS process sequence utilized in the array fabrication resulted in yields as high as 50% and produced high-quality complementary devices wit11 field-effect mobilities of 320 and 160 cm´/V-s for electrons and holes, respectively. The drastic reduction of parasitic capacitance inherent in SOS technology combined witn these device characteristics was found to provide circuits, while retaining all of the other desirable characteristics.
  • Keywords
    Boron; Charge carrier processes; Circuits; Clocks; Electron mobility; Etching; Laboratories; Shift registers; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference. Digest of Technical Papers. 1970 IEEE International
  • Conference_Location
    Philadelphia, PA, USA
  • Type

    conf

  • DOI
    10.1109/ISSCC.1970.1154834
  • Filename
    1154834