DocumentCode :
2849614
Title :
High speed silicon-on-sapphire 50-stage shift register
Author :
Meyer, Jorg ; Burns, Jack ; Scott, James
Author_Institution :
RCA Laboratories, Princeton, NJ, USA
Volume :
XIII
fYear :
1970
fDate :
18-20 Feb. 1970
Firstpage :
200
Lastpage :
201
Abstract :
developed and have resulted in the successful realization of hlgh performance silicon-on-sapphire shift-register arrays. Features of the array are clocked operation from 300 kHz to 75 MHz over 50 stages. A complementary MOS process sequence utilized in the array fabrication resulted in yields as high as 50% and produced high-quality complementary devices wit11 field-effect mobilities of 320 and 160 cm´/V-s for electrons and holes, respectively. The drastic reduction of parasitic capacitance inherent in SOS technology combined witn these device characteristics was found to provide circuits, while retaining all of the other desirable characteristics.
Keywords :
Boron; Charge carrier processes; Circuits; Clocks; Electron mobility; Etching; Laboratories; Shift registers; Silicon; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1970 IEEE International
Conference_Location :
Philadelphia, PA, USA
Type :
conf
DOI :
10.1109/ISSCC.1970.1154834
Filename :
1154834
Link To Document :
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