To Analyze the Plasma Chambers Characteristics by 1/k Value Deduced From RF Parameters Collected by Impedance Meter

The RF impedance meter is one of in-situ, noninvasive techniques to monitor the status of RF power delivery, and to derive the electrical property in the plasma chamber. This study proposes a measurement, 1/k value, which carry some plasma characteristics such as ion current and its evolution during process. This measurement can be applied to MERIE tools or ICP tools. It is shown that the statistic of electrical quantities, said sheath resistance |Z_sh|/cosPhi_sh and sheath voltage V_sh, in a MERIE plasma is similar to that of the ICP sheath model proposed by Sobolewski. It might serve as an index among several homogeneous chambers, or measurement of stability for individual chamber during a long time of observation.