DocumentCode :
2850272
Title :
Effect of a p-AlInAs electron stopper layer in 1.3 μm AlGaInAs/InP strained multiple quantum well lasers
Author :
Takemasa, Keizo ; Munakata, Tsutomu ; Kobayashi, Masao ; Wada, Hiroshi ; Kamijoh, Takeshi
Author_Institution :
Semicond. Technol. Lab., Oki Electr. Ind. Co. Ltd., Tokyo, Japan
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
835
Lastpage :
838
Abstract :
We have investigated the effect of a p-AlInAs electron stopper layer (ESL) in 1.3-μm AlGaInAs/InP strained multiple quantum well (MQW) lasers. The ESL was inserted between the MQW and p-side separate confinement heterostructure (SCH) layers to suppress the electron overflow from the MQW to p-SCH. The characteristic temperatures of the threshold currents and slope efficiencies were improved in the lasers with the stopper layers, especially at higher temperatures. As a result, a maximum CW operating temperature Tmax was increased by 20°C, and Tmax of 210 and 170°C under pulse and CW excitation was achieved, respectively
Keywords :
III-V semiconductors; aluminium compounds; electron traps; gallium arsenide; indium compounds; quantum well lasers; 1.3 μm AlGaInAs/InP strained multiple quantum well lasers; 210 to 170 C; AlGaInAs-InP; AlInAs; electron overflow; p-AlInAs electron stopper layer; p-side separate confinement heterostructure; slope efficiencies; threshold currents; Ash; Doping; Electrons; Epitaxial growth; Indium phosphide; Optical device fabrication; Quantum well devices; Substrates; Temperature; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712797
Filename :
712797
Link To Document :
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