DocumentCode :
2851929
Title :
Carrier transport in charge-coupled devices
Author :
C.-K.Kim
Author_Institution :
Fairchild Research and Development Lab., Palo Alto, CA, USA
Volume :
XIV
fYear :
1971
fDate :
17-19 Feb. 1971
Firstpage :
158
Lastpage :
159
Abstract :
The transfer characteristics of charge-coupled devices have been studied by considering the transport of carriers at Si-SiO2interface. Good agreement between theory and experiment has been achieved by adjusting the surface mobility alone.
Keywords :
Boundary conditions; Electrodes; Equations; Laboratories; MOS capacitors; Potential well; Research and development; Substrates; Surface charging; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1971 IEEE International
Conference_Location :
Philadelphia, PA, USA
Type :
conf
DOI :
10.1109/ISSCC.1971.1154967
Filename :
1154967
Link To Document :
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