• DocumentCode
    2853047
  • Title

    Optimized CMOS-SOI process for high performance RF switches

  • Author

    Joshi, A.B. ; Lee, Sang-Rim ; Chen, Y.Y. ; Lee, T.Y.

  • Author_Institution
    Skyworks Solutions, Inc., Irvine, CA, USA
  • fYear
    2012
  • fDate
    1-4 Oct. 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In recent years, CMOS on Silicon-on-Insulator has rapidly evolved as a mainstream technology for switches used in wireless applications. Since such applications can involve switching high power levels (35 dBm) at high frequencies (~2 GHz), the technology considerations are substantially different than those for SOI used in high speed, small signal applications such as microprocessors. This paper provides an overview of key technology challenges and trade-offs.
  • Keywords
    CMOS integrated circuits; field effect MMIC; microwave switches; silicon-on-insulator; Si; high performance RF switches; microprocessors; optimized CMOS-SOI process; silicon-on-insulator; Antennas; Linearity; Optimization; Radio frequency; Substrates; Switches; Wireless communication;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2012 IEEE International
  • Conference_Location
    NAPA, CA
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-4673-2690-2
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2012.6404385
  • Filename
    6404385