DocumentCode
2855079
Title
Design of high-frequency SAW filters
Author
Shermagina, Ye.Yu. ; Mashinin, O.V. ; Sinitsyna, T.V.
Author_Institution
BUTIS-M Ltd., Moscow
Volume
2
fYear
2005
fDate
16-16 Sept. 2005
Firstpage
570
Abstract
Standard contact photolithography are used for IF filters, inorder to manufacture 25...400 MHz operating frequencies, which corresponds to the 1.1...15 mum dimensions of pin structures. Results are presented of investigating different designs of high-frequency SAW filters for applications in IF paths of communications systems
Keywords
photolithography; surface acoustic wave filters; telecommunication; 1.1 to 15 micron; 25 to 400 MHz; IF filter; communications system; high-frequency SAW filter; photolithography; pin structure; surface acoustic wave; Displays; Electrodes; Frequency; Organizing; Passband; Power harmonic filters; SAW filters; Surface acoustic waves; Transducers; Transversal filters;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave & Telecommunication Technology, 2005 15th International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
966-7968-80-4
Type
conf
DOI
10.1109/CRMICO.2005.1565040
Filename
1565040
Link To Document