Title :
An experimental high-density memory array fabricated with electron beam
Author :
Yu, Haoyong ; Dennard, R. ; Chang, Ting-Hao ; Hatzakis, M.
Author_Institution :
IBM T. J. Watson Research Center, Yorktown Heights, NY, USA
Keywords :
Aluminum; Capacitance; Electron beams; Geometrical optics; Integrated circuit technology; Large scale integration; Lithography; Resists; Silicon; Testing;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1973 IEEE International
Conference_Location :
Philadelphia, PA, USA
DOI :
10.1109/ISSCC.1973.1155176
