• DocumentCode
    2857797
  • Title

    Local oxidation of silicon/CMOS: Technology/design system for LSI in CMOS

  • Author

    Strachan, Alejandro ; Wagner, Karl

  • Author_Institution
    Philips IC Development Dept., Nijmegen, Netherlands
  • Volume
    XVII
  • fYear
    1974
  • fDate
    15-13 Feb. 1974
  • Firstpage
    60
  • Lastpage
    61
  • Abstract
    The LOCMOS process and its ability to increase packing density and reduce cost of LSI CMOS circuits will be presented. A computer-aided layout system which can be used for wildlogic circuits using this technology will also be described.
  • Keywords
    Aluminum; CMOS technology; Computational modeling; Counting circuits; Integrated circuit interconnections; LAN interconnection; Large scale integration; Logic testing; Oxidation; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference. Digest of Technical Papers. 1974 IEEE International
  • Conference_Location
    Philadelphia, PA, USA
  • Type

    conf

  • DOI
    10.1109/ISSCC.1974.1155337
  • Filename
    1155337
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2857797