Title :
Local oxidation of silicon/CMOS: Technology/design system for LSI in CMOS
Author :
Strachan, Alejandro ; Wagner, Karl
Author_Institution :
Philips IC Development Dept., Nijmegen, Netherlands
Abstract :
The LOCMOS process and its ability to increase packing density and reduce cost of LSI CMOS circuits will be presented. A computer-aided layout system which can be used for wildlogic circuits using this technology will also be described.
Keywords :
Aluminum; CMOS technology; Computational modeling; Counting circuits; Integrated circuit interconnections; LAN interconnection; Large scale integration; Logic testing; Oxidation; Silicon;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1974 IEEE International
Conference_Location :
Philadelphia, PA, USA
DOI :
10.1109/ISSCC.1974.1155337
