Title :
Development of thin film resistors for use in multichip modules
Author :
Coates, K.L. ; Chien, C.-P. ; Hsiao, Y.-Y.R. ; Kovach, D.J. ; Tang, C.-H. ; Tanielian, M.H.
Author_Institution :
Boeing Co., Seattle, WA, USA
Abstract :
Boeing´s current MCM-D process is based on polyimide dielectric and Cu interconnects passivated with thin film Ti. Materials and processes are being developed to integrate passive components (resistors, capacitors and inductors) into these MCM-D substrates in order to make further improvements in Boeing´s electronics technology. By embedding passive components into MCMs, the size, weight, and cost of MCMs can be minimized while improving performance and reliability. This paper describes the development of low value TaNx resistor elements suitable for integration into MCMs. The criteria for the resistor fabrication technology was that it be based on thin film processing for compatibility with the MCM-D fabrication process. Development of both the TaNx thin film deposition process and the patterned resistor fabrication process are discussed. X-ray analysis of the TaNx film, resistor trimming, environmental test results, and integration into an MCM structure are also described
Keywords :
X-ray analysis; dielectric thin films; electron device testing; environmental testing; integrated circuit interconnections; integrated circuit packaging; machining; multichip modules; polymer films; tantalum compounds; thin film resistors; Boeing electronics technology; Cu interconnects; MCM cost; MCM performance; MCM reliability; MCM size; MCM structure integration; MCM weight; MCM-D fabrication process; MCM-D process; MCM-D substrates; TaN; TaNx film; TaNx resistor elements; TaNx thin film deposition process; Ti-Cu; X-ray analysis; capacitors; embedded passive components; environmental test; inductors; multichip modules; passive component integration; patterned resistor fabrication process; polyimide dielectric; resistor fabrication technology; resistor trimming; resistors; thin film Ti passivation; thin film processing; thin film resistors; Capacitors; Dielectric materials; Dielectric substrates; Dielectric thin films; Fabrication; Multichip modules; Polyimides; Resistors; Thin film inductors; Transistors;
Conference_Titel :
Multichip Modules and High Density Packaging, 1998. Proceedings. 1998 International Conference on
Conference_Location :
Denver, CO
Print_ISBN :
0-7803-4850-8
DOI :
10.1109/ICMCM.1998.670829