DocumentCode
2859005
Title
Positive optical lithography
Author
Dill, F.
Author_Institution
IBM T.J. Watson Research Center, Yorktown Heights, NY, USA
Volume
XVIII
fYear
1975
fDate
27426
Firstpage
54
Lastpage
55
Abstract
New techniques for characterizing and modeling the positive photoresist process have led to a quantitative understanding of the optical lithographic process. The model treats nonlinear exposure and development processes and resolved optical interference effects within the resist, permitting a new ability to understand and control lithography, and enabling the replacement of black magic by engineering.
Keywords
Absorption; Chemicals; Inhibitors; Lithography; Optical devices; Optical films; Optical materials; Optical refraction; Optical sensors; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1975 IEEE International
Type
conf
DOI
10.1109/ISSCC.1975.1155417
Filename
1155417
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