Title :
Positive optical lithography
Author_Institution :
IBM T.J. Watson Research Center, Yorktown Heights, NY, USA
Abstract :
New techniques for characterizing and modeling the positive photoresist process have led to a quantitative understanding of the optical lithographic process. The model treats nonlinear exposure and development processes and resolved optical interference effects within the resist, permitting a new ability to understand and control lithography, and enabling the replacement of black magic by engineering.
Keywords :
Absorption; Chemicals; Inhibitors; Lithography; Optical devices; Optical films; Optical materials; Optical refraction; Optical sensors; Resists;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1975 IEEE International
DOI :
10.1109/ISSCC.1975.1155417
