DocumentCode :
285937
Title :
Integration of GaAs quantum well devices using dielectric cap disordering
Author :
Ayling, S.G. ; Beauvais, J. ; Marsh, J.H.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
fYear :
1993
fDate :
34033
Firstpage :
42491
Lastpage :
42494
Abstract :
Dielectric cap disordering has been used to fabricate low loss waveguide regions in GaAs/AlGaAs quantum well material. These have been integrated with an undisordered laser region to form extended cavity lasers with cavity lengths of up to 2 mm and propagation losses as low as 4 cm-1. Furthermore, extended ridge waveguide cavities have been fabricated with Bragg reflectors to form DBR lasers with gratings of length 1 mm. Dielectric cap disordering has also been used to demonstrate selective intermixing in selected areas enabling regions of different band cap to be created simultaneously in one piece of epitaxial material
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium arsenide; integrated optics; laser cavity resonators; optical losses; semiconductor lasers; semiconductor quantum wells; 1 mm; 2 mm; Bragg reflectors; DBR lasers; GaAs-AlGaAs quantum well material; III-V semiconductor; dielectric cap disordering; extended cavity lasers; extended ridge waveguide cavities; gratings; integration; low loss waveguide regions; propagation losses; selective intermixing; undisordered laser region;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Applications of Quantum Well Technologies, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
230878
Link To Document :
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