Title :
Excimer laser-plasma X-ray source; lithographic and microscopic/holographic applications
Author_Institution :
SERC Rutherford Appleton Lab., Chilton, UK
Abstract :
A high peak and average power excimer laser-plasma X-ray source has been developed for university and industrial users. The author describes: (a) the new pulse-train KrF laser system constructed around commercial excimer lasers for maximum X-ray conversion efficiency and average power; (b) spectral, spatial and temporal characteristics of the X-ray source as well as absolute emission measurements; (c) applications of the X-ray generated to submicron lithography microscopy and holography
Keywords :
X-ray lithography; X-ray microscopy; X-ray production; excimer lasers; holography; krypton compounds; plasma production and heating by laser beam; KrF laser; X-ray holography microscopy; X-ray microscopy; X-ray proximity lithography; absolute emission measurements; average power; excimer laser-plasma X-ray source; maximum X-ray conversion efficiency; pulse train system; spatial characteristics; spectral characteristics; submicron lithography; temporal characteristics;
Conference_Titel :
Laser Applications, IEE Colloquium on
Conference_Location :
London
