DocumentCode
286095
Title
Excimer laser-plasma X-ray source; lithographic and microscopic/holographic applications
Author
Turcu, I.C.E.
Author_Institution
SERC Rutherford Appleton Lab., Chilton, UK
fYear
1993
fDate
34078
Firstpage
42430
Lastpage
42432
Abstract
A high peak and average power excimer laser-plasma X-ray source has been developed for university and industrial users. The author describes: (a) the new pulse-train KrF laser system constructed around commercial excimer lasers for maximum X-ray conversion efficiency and average power; (b) spectral, spatial and temporal characteristics of the X-ray source as well as absolute emission measurements; (c) applications of the X-ray generated to submicron lithography microscopy and holography
Keywords
X-ray lithography; X-ray microscopy; X-ray production; excimer lasers; holography; krypton compounds; plasma production and heating by laser beam; KrF laser; X-ray holography microscopy; X-ray microscopy; X-ray proximity lithography; absolute emission measurements; average power; excimer laser-plasma X-ray source; maximum X-ray conversion efficiency; pulse train system; spatial characteristics; spectral characteristics; submicron lithography; temporal characteristics;
fLanguage
English
Publisher
iet
Conference_Titel
Laser Applications, IEE Colloquium on
Conference_Location
London
Type
conf
Filename
231100
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