In vacuo measurement of the sensitivity limit of planar Bragg sensors

Author

Parker, R.M. ; Gates, J.C. ; Sessions, N.P. ; Kundys, D.O. ; Gawith, C.B. ; Grossel, M.C. ; Smith, P.G.R.

Author_Institution

Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK

fYear

2009

fDate

14-19 June 2009

Firstpage

1

Lastpage

1

Abstract

We present the direct measurement and modeling of the sensitivity limit of an integrated refractive index sensor for the detection of molecular monolayers. Direct UV writing can be used to fabricate a wide range of integrated optical devices particularly Bragg gratings. These Bragg gratings are inherently sensitive to temperature and strain. By etching a portion of the cladding, the mode within the grating region can be exposed to an analyte. The spectral response of the grating provides information about the refractive index of the analyte.

Keywords

Bragg gratings; etching; integrated optics; monolayers; optical fabrication; optical sensors; optical variables measurement; refractive index; spectral analysis; Bragg gratings; analyte refractive index information; cladding etching; direct UV writing; grating spectral response; in vacuo measurement; integrated optical device fabrication; integrated refractive index sensor; molecular monolayer detection; planar Bragg sensor sensitivity limit; strain sensitivity; temperature sensitivity; Bragg gratings; Etching; Optical refraction; Optical surface waves; Optical waveguides; Plasma measurements; Pollution measurement; Refractive index; Silicon compounds; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-4079-5

Electronic_ISBN

978-1-4244-4080-1

Type

conf

DOI

10.1109/CLEOE-EQEC.2009.5196282

Filename

5196282