DocumentCode :
2862092
Title :
Source/drain doping influence on heterojunction graphene nanoribbon tunneling field effect transistors
Author :
Da, Haixia ; Lam, Kai-Tak ; Samudra, Ganesh S. ; Liang, Gengchiau ; Chin, Sai-Kong
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
fYear :
2011
fDate :
21-24 June 2011
Firstpage :
1
Lastpage :
2
Abstract :
We investigate the device performance of heterojunction graphene nanoribbons tunneling field-effect transistors as a function of the doping concentrations based on the non-equilibrium Green´s function. We observe that variation in source doping changes the OFF-non-equilibrium Green´s functionstate currents (IOFF), the ON-state currents (ION) and the subthreshold slope (SS) significantly while variation in drain doping changes mainly the IOFF. Additionally, low SS and large ION/IOFF ratio can be achieved by applying proper asymmetric source-drain doping.
Keywords :
high electron mobility transistors; semiconductor doping; tunnel transistors; OFF-non-equilibrium Green functionstate currents; ON-state currents; asymmetric source-drain doping; doping concentrations; heterojunction graphene nanoribbon tunneling field effect transistors; source doping; subthreshold slope; device performance; doping concentration; graphene nanoribbon; heterojunction; tunneling field-effect transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2011 IEEE 4th International
Conference_Location :
Tao-Yuan
ISSN :
2159-3523
Print_ISBN :
978-1-4577-0379-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2011.5991711
Filename :
5991711
Link To Document :
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