DocumentCode :
2862284
Title :
The impact of gate insulator dielectric constant on performance of CNTFETs at different ambient temperatures
Author :
Shirazi, Shaahin G. ; Mirzakuchaki, Sattar
Author_Institution :
EE. Dept., Univ. of Sci. & Technol., Tehran, Iran
fYear :
2011
fDate :
21-24 June 2011
Firstpage :
1
Lastpage :
2
Abstract :
Carbon nanotube field effect transistors are the most promising candidate for replacing of current silicon transistor technology. Choosing a suitable dielectric constant for a specific temperature range is important in determining device performance. For higher dielectric constant, rising up the temperature causes current ratio to diminish, while at lower dielectric constants the current ratio increases. An interesting case is observed for transistors with dielectric constants in the middle range which exhibit an approximately constant current ratio for all ambient temperatures considered.
Keywords :
carbon nanotubes; field effect transistors; permittivity; CNTFET; ambient temperatures; carbon nanotube field effect transistors; gate insulator dielectric constant; silicon transistor technology; CNTFETs; Carbon nanotubes; Dielectric constant; Leakage current; Logic gates; Temperature; CNTFET; NEGF; ambient temperature; device performance; gate insulator dielectric;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2011 IEEE 4th International
Conference_Location :
Tao-Yuan
ISSN :
2159-3523
Print_ISBN :
978-1-4577-0379-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2011.5991722
Filename :
5991722
Link To Document :
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