Title :
X-ray diffraction analysis of self-ordered porous anodic alumina
Author :
Wu, Ya-Fen ; Huang, Jeng-Kuang ; Lee, Jiunn-Chyi
Author_Institution :
Dept. of Electron. Eng., Ming Chi Univ. of Technol., Taipei, Taiwan
Abstract :
We report on the structural properties of porous anodic alumina (PAA) film produced by the anodization technique under different annealing temperatures. X-ray diffraction (XRD) measurement was performed and simulated by theoretical analysis model. From the analysis, it is found that sample prepared with higher annealing temperature exhibits larger interpore spacing and the pore array uniformity is slightly lowered down with higher annealing temperature. To verify the theoretical calculation results, images of the sample surfaces were obtained by field-emission scanning electron microscopic (FE-SEM). The FE-SEM images of the surface morphology of the samples are coinciding with the results obtained from XRD line profile analysis.
Keywords :
X-ray diffraction; annealing; anodisation; field emission electron microscopy; surface morphology; FE-SEM images; X-ray diffraction analysis; X-ray diffraction measurement; XRD line profile analysis; annealing temperature; anodization technique; field-emission scanning electron microscopic; interpore spacing; pore array uniformity; porous anodic alumina film; self-ordered porous anodic alumina; surface morphology; Aluminum; Annealing; Arrays; Films; Surface morphology; X-ray diffraction; X-ray scattering; Fourier transform; X-ray diffraction; nanostructure size distribution; porous anodic alumina;
Conference_Titel :
Nanoelectronics Conference (INEC), 2011 IEEE 4th International
Conference_Location :
Tao-Yuan
Print_ISBN :
978-1-4577-0379-9
Electronic_ISBN :
2159-3523
DOI :
10.1109/INEC.2011.5991726