• DocumentCode
    2862498
  • Title

    Cation-based resistive memory

  • Author

    Kozicki, Michael N.

  • Author_Institution
    Center for Appl. Nanoionics, Arizona State Univ., Tempe, AZ, USA
  • fYear
    2011
  • fDate
    21-24 June 2011
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    This paper describes cation-based resistive memory, which utilizes a high resistance silver- or copper-containing oxide or higher chalcogenide electrolyte sandwiched between oxidizable and inert electrodes. Device function is via ion transport and redox reactions which form or dissolve a conductive metallic bridge. The on-state resistance is controlled by the programming conditions, allowing multi-level/multi-bit storage via discrete resistance states. A doped Si electrode may be used with the on-state filament to create an integrated rectifying isolation element which potentially allows multi-layer compact passive structures to be fabricated. The paper features foundry-produced arrays as well as some of the latest research findings on devices that utilize Ag-Ge-S and Cu-SiO2 ion conducting films.
  • Keywords
    copper compounds; electrolytes; germanium compounds; oxidation; positive ions; random-access storage; silicon compounds; silver compounds; Ag-Ge-S; Cu-SiO2; cation-based resistive memory; chalcogenide electrolyte; conductive metallic bridge; copper-containing oxide; device function; discrete resistance state; doped Si electrode; foundry-produced arrays; inert electrode; integrated rectifying isolation element; ion conducting film; ion transport; multibit storage; multilevel storage; on-state filament; on-state resistance; oxidizable; programming condition; redox reaction; silver-containing oxide; Copper; Electrodes; Programming; Resistance; Schottky diodes; Silicon; Switches; Ionic memory; Programmable Metallization Cell; multi-level cell and active and passive arrays; resistance change;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2011 IEEE 4th International
  • Conference_Location
    Tao-Yuan
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4577-0379-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2011.5991737
  • Filename
    5991737