DocumentCode :
2862616
Title :
Statistical analysis and yield optimization in practical RF and microwave designs
Author :
Biernacki, Radek ; Chen, Steve ; Estep, George ; Rousset, Jean ; Sifri, Jack
Author_Institution :
Agilent Technologies, Inc., 1400 Fountaingrove Pkwy, Santa Rosa, CA 95403, USA
fYear :
2012
fDate :
17-22 June 2012
Firstpage :
1
Lastpage :
3
Abstract :
This presentation provides a historical perspective of the advances in statistical design methodologies for microwave design tools. We focus on some of the early efforts by John Bandler to turn his research advances into practical results. We describe the formulation of the yield optimization problem, in particular the powerful one-sided ℓ1 objective function. We discuss modeling requirements to properly account for statistical variations in IC manufacturing. We also describe applications of yield sensitivities and design of experiments (DOE) as well as a recent technique for fast CMOS mismatch analysis.
Keywords :
Integrated circuit modeling; Manufacturing; Microwave circuits; Monte Carlo methods; Optimization; Semiconductor device modeling; CADCAM; Design methodology; Monte Carlo methods; design for manufacture; design optimization; microwave theory and techniques; statistical analysis; yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest (MTT), 2012 IEEE MTT-S International
Conference_Location :
Montreal, QC, Canada
ISSN :
0149-645X
Print_ISBN :
978-1-4673-1085-7
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2012.6259360
Filename :
6259360
Link To Document :
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