Title :
Enhancement of laser nano-patterning of semiconductors: Direct ablation of PMMA coated silicon
Author :
Klein-Wiele, J.-H. ; Simon, P.
Author_Institution :
Laser-Lab. Gottingen e.V., Gottingen
Abstract :
Sub-micron patterning of silicon is demonstrated by direct femtosecond laser ablation. An enhancement of the ablation rate and a reduction of debris formation are achieved by covering the surface with a PMMA layer prior to ablation.
Keywords :
high-speed optical techniques; laser ablation; nanopatterning; polymer films; PMMA coated silicon direct ablation; Si; femtosecond laser ablation; laser semiconductor nanopatterning; submicron patterning; Laser ablation; Optical device fabrication; Optical materials; Pulsed laser deposition; Semiconductor lasers; Silicon; Surface emitting lasers; Surface morphology; Ultrafast electronics; Ultrafast optics; 140.3390; 220.4000; 320.2250;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4627758
