A PSQ-L polymer microring resonator fabricated by a simple UV-based soft-lithography process

Author

Teng, Jie ; Scheerlinck, Stijn ; Morthier, Geert ; Baets, Roel

Author_Institution

INTEC-Dept., Ghent Univ.-IMEC, Ghent, Belgium

fYear

2009

fDate

14-19 June 2009

Firstpage

1

Lastpage

1

Abstract

In this work, a laterally coupled microring resonator is designed and fabricated. After fabrication, the ring resonator is characterized. The measured transmission spectrum of the ring resonator is presented. The FWHM (full width of half maximum) is about 0.037nm. By taking the ratio between the resonance wavelength and FWHM, a Q factor of about 4.2 times 10⁴ is calculated. About 6dB extinction ratio at the through port and 18dB extinction ratio at the drop port is obtained.

Keywords

optical fabrication; optical polymers; optical resonators; soft lithography; ultraviolet lithography; PSQ-L polymer microring resonator; UV soft lithography process; laterally coupled microring resonator; Arrayed waveguide gratings; Optical device fabrication; Optical films; Optical materials; Optical polymers; Optical resonators; Optical ring resonators; Optical waveguides; Photonics; Polymer films;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-4079-5

Electronic_ISBN

978-1-4244-4080-1

Type

conf

DOI

10.1109/CLEOE-EQEC.2009.5196462

Filename

5196462