Title :
Ultrafast laser deposition of oxide glass film
Author :
Jose, G. ; Irannejad, M. ; Steenson, D.P. ; Jha, A.
Author_Institution :
Inst. for Mater. Res., Univ. Leeds, Leeds, UK
Abstract :
This paper reports the use of femtosecond laser ablation of glass target to fabricate oxide glass films. The ultrafast laser deposition offers much larger film growth rates and less particulates comparing to excimer laser deposition. This will enable one to fabricate good optical quality glass films thicker than 1 micron for planar waveguides and photonic integrated devices.
Keywords :
high-speed optical techniques; optical films; optical glass; optical planar waveguides; pulsed laser deposition; oxide glass film; photonic integrated devices; planar waveguides; ultrafast laser deposition; Glass; Integrated optics; Laser ablation; Optical devices; Optical films; Optical planar waveguides; Optical waveguides; Planar waveguides; Ultrafast optics; Waveguide lasers;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5196464
