Title :
Soft UV-nanoimprint lithography for the fabrication of frequency selective components
Author :
Viheriälä, J. ; Tommila, J. ; Laakso, A. ; Ranta, S. ; Vartiainen, I. ; Tuovinen, H. ; Telkkälä, J. ; Vallius, T. ; Niemi, T. ; Dumitrescu, M. ; Pessa, M.
Author_Institution :
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
Abstract :
In this paper, we demonstrate the use of the soft UV-NIL in two important applications. We show, first time in the world, soft UV-NIL based process for fabricating a distributed feedback laser diode (DFB-LD) and illustrate a fabrication process for a nanostructured waveguide in LiNbO3- crystal intended for frequency conversion.
Keywords :
distributed feedback lasers; lithium compounds; nanofabrication; nanolithography; nanophotonics; optical fabrication; optical frequency conversion; optical waveguides; semiconductor lasers; soft lithography; ultraviolet lithography; DFB-LD; LiNbO3; distributed feedback laser diode; fabrication process; frequency conversion; frequency selective component; nanostructured waveguide; soft UV-nanoimprint lithography; Distributed feedback devices; Frequency conversion; Gratings; Laser mode locking; Lithography; Optical device fabrication; Optical modulation; Optical waveguides; Physics; Titanium;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5196481
