Title :
Fabrication of submicron Si spheres on SOI platform by using excimer laser reformation technique
Author :
Hung, S.C. ; Shiu, S.C. ; Chao, C.S. ; Lin, C.F.
Author_Institution :
Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
Since silicon is the dominating material in current integrated circuit industry, fabricating microspheres on a Si-based substrate contributes to compact and low-cost photonics for mass-market applications. The authors present a technique applying the homogenized KrF excimer laser reformation to fabricate crystalline Si spheres on the SOI platform.
Keywords :
excimer lasers; krypton compounds; silicon-on-insulator; substrates; KrF; SOI platform; Si; crystalline silicon spheres; excimer laser reformation; integrated circuit industry; microspheres; silicon based substrate; Crystalline materials; Crystallization; Lighting; Optical device fabrication; Optical materials; Optimized production technology; Photonic crystals; Q factor; Scanning electron microscopy; Silicon;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5196498
