DocumentCode
2865809
Title
Low-damage Type-II waveguide writing in fused silica with femtosecond and picosecond lasers
Author
Zhang, Haibin ; Eaton, Shane ; Hosseini, Abbas ; Herman, Peter R.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
A new domain of rapid waveguide writing using 50 to 1500 fs laser pulses is presented for fused silica. Type II photosensitivity mechanisms are inferred for the low-loss waveguides, imprinted with coarsely overlapping pulses.
Keywords
optical pulse shaping; optical waveguides; silicon compounds; femtosecond lasers; fused silica; laser pulses; low damage; low loss waveguides; overlapping pulses; picosecond lasers; time 50 fs to 1500 fs; type-II waveguide writing; Laser modes; Lenses; Microscopy; Optical pulses; Optical waveguides; Silicon compounds; Ultrafast optics; Waveguide components; Waveguide lasers; Writing; (160.2750) Glass and other amorphous materials; (320.2250) Femtosecond phenomena;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4627905
Filename
4627905
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